Volume 12 Issue 2
Apr.  2019
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Chinese Optics  > 2019  >  12(2): 371-381.
ZHENG Chang-bin, SHAO Jun-feng, LI Xue-lei, WANG Hua-long, WANG Chun-rui, CHEN Fei, WANG Ting-feng, GUO Jin. Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film[J]. Chinese Optics, 2019, 12(2): 371-381. doi: 10.3788/CO.20191202.0371
Citation: ZHENG Chang-bin, SHAO Jun-feng, LI Xue-lei, WANG Hua-long, WANG Chun-rui, CHEN Fei, WANG Ting-feng, GUO Jin. Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film[J]. Chinese Optics, 2019, 12(2): 371-381. doi: 10.3788/CO.20191202.0371
shu

Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film

  • 1.

    State Key Laboratory of Laser Interaction with Matter, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

  • 2.

    University of Chinese Academy of Sciences, Beijing 100049, China

Funds:

Fundamental Research Project of Chinese State Key Laboratory of Laser Interaction With Matter SKLLIM-1502

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  • Author Bio:

    ZHENG Changbin(1981—), male, Fujin, Heilongjiang, Ph.D., Associate Researcher, B.S. in physics, college of physics, Jilin Univeristy, 2001-2005; Ph.D in optics, deportment of physics, Harbin Institute of Technology, 2005-2011 is mainly engaged in research on the effects of laser irradiation. E-mail:zhengchangbin@ciomp.ac.cn

  • Corresponding author: Chang-bin, E-mail:zhengchangbin@ciomp.ac.cnZHENG
  • Received Date: 23 Jan 2018
  • Rev Recd Date: 20 Mar 2018
  • Publish Date: 01 Apr 2019
    Abstract
  • In order to understand the ultrafast laser-induced damage mechanisms of typical imaging sensor's film structures, the damage characteristics of Si-based multi-layer films irradiated by a femtosecond pulsed laser were investigated, and the laser pulse fluence ranges and threshold conditions corresponding to various damage phenomena were evaluated. Si-based multi-layer films that were similar in structure of CCD were prepared by electron beam deposition. The damage characteristics of these films irradiated by a femtosecond pulsed laser with wavelength of 800 nm and pulse width of 100 fs under different pulse fluences and numbers were investigated using a metallurgical microscope. Experimental results showed that the laser-affected zone size increased linearly with pulse fluence in the range of 1.01 to 24.7 J/cm2. Surface damage caused by oxidation/amorphization, non-thermal ablation, and laser-induced plasma ablation could be observed in the laser irradiated zone, which tightly depended on the pulse fluence. Multi-layer damage could be observed and the damage probability increased from 1% to 51% in the pulse fluence range from 2.42 to 24.7 J/cm2. Irradiated by sequent pulses at a fluence of 1.01 J/cm2, the laser affected zone remained almost unchanged and the ablated depth increased with the pulse number. From the single pulse damage experiment data, the femtosecond pulse laser-induced surface damage threshold was evaluated to be 0.543 J/cm2 and laser-induced multi-layer stress damage threshold was linearly fitted to be 2.16 J/cm2. Sequent pulse irradiation with low fluence(≤ 1.01 J/cm2) also could lead to deep damage on the multi-layer film.

     

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